Evaluation of ion/electron beam induced deposition for electrical connection using a modern focused ion beam system

Focused electron beam induced deposition: A perspective

BACKGROUND Focused electron beam induced deposition (FEBID) is a direct-writing technique with nanometer resolution, which has received strongly increasing attention within the last decade. In FEBID a precursor previously adsorbed on a substrate surface is dissociated in the focus of an electron beam. After 20 years of continuous development FEBID has reached a stage at which this technique is ...

Focused Ion Beam Lithography

Sculpting on polymers using focused ion beam

Available online 13 June 2008 It has been recently shown t

Microscale Metallography Using Focused Ion Beam

Microstructural examination can provide a rich tapestry of information about the processing and application history of a metal component. For this reason, microstructural characterization is a fundamental tool for failure analysis of these components. To reduce costs and accommodate demands for smaller packaging, many applications currently use metallic components where the critical dimensions ...

Ohmic Contact Fabrication Using a Focused-ion Beam Technique and Electrical Characterization for Layer Semiconductor Nanostructures.

Layer semiconductors with easily processed two-dimensional (2D) structures exhibit indirect-to-direct bandgap transitions and superior transistor performance, which suggest a new direction for the development of next-generation ultrathin and flexible photonic and electronic devices. Enhanced luminescence quantum efficiency has been widely observed in these atomically thin 2D crystals. However, ...